Preparation of porous silica as an antireflective (AR) coating for glass surfaces

Khwanchit Wongcharee

Department of Chemical Engineering, Mahanakorn university of Technology, Cheum-Sampan Rd., Nong Chok, Bangkok 10530, Thailand

Michael Brungs and Y.J. Hong

School of Chemical Engineering and Industrial Chemistry, UNSW, Sydney 2052, Australia

Manuscript received February 2, 2006

Revised March 6, 2006




Antireflective film on glass was prepared by sol-gel process with dip-coating method. In the process, the effect of “aging” was combined with the incorporation of polyethylene glycol (PEG) as pore forming agent into an acid-catalyzed sol from a tetraethylorthosilicate (TEOS) precursor. The coated glass was baked at temperature of 400°C in order to decompose the organic polymer and create pores in the film. Using a simple single step coating, a porous silica (SiO2) film with refractive index of 1.25 and thickness ~ 110 nm was obtained. The film increased the maximum transmittance of coated glass to 99.7% compared to ~92% of bare glass.



Keywords: Antireflective coating, porous silica, sol-gel, transmittance

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